3D Atomprobe Tomography (3D-APT)

Analyte:         

• organic and inorganic materials, composites, semiconductors, powders or compact samples, thin-film structures
• sample requirements: solid, non-volatile, conducting, semiconducting, non-conducting
• required amount of sample: (below) few milligrams  

Applications:

• 3-dimensional investigation of the composition of nanoscale structures with atomic resolution
• Grain boundaries and interfaces  (i.e. Nd₂Fe₁₄B permanent magnets)
• Diffusion profiles in doped semiconductors, abruptness and roughness of interfaces 
• Quantitative Element specific microstructure with high sensitivity

Technical details and experimental setup: 

LEAP 4000X HR (CAMECA Inc.)

• Sensitivity of ~ 5 ppm  (depends on the size of the sample and the resulting dataset)
• Laser desorption for the analysis of non- or semi-conducting materials (355 nm wavelength, <10 ps pulsing, up to 250 kHz repetition rate)
• Reflectron time of flight mass spectrometry setup offers highest mass resolving power
• Sample preparation by focused ion beam lift out with state of the art FIB-Microscope (XB-540, Carl-Zeiss)