Analyte:
- organic and inorganic materials, composites, semiconductors, powders or compact samples, thin-film structures
- sample requirements: solid, non-volatile, conducting, semiconducting, non-conducting
- required amount of sample: (below) few milligrams
Applications:
- 3-dimensional investigation of the composition of nanoscale structures with atomic resolution
- Grain boundaries and interfaces (i.e. Nd2Fe14B permanent magnets)
- Diffusion profiles in doped semiconductors, abruptness and roughness of interfaces
- Quantitative Element specific microstructure with high sensitivity
Technical details and experimental setup:
LEAP 4000X HR (CAMECA Inc.)
- Sensitivity of ~ 5 ppm (depends on the size of the sample and the resulting dataset)
- Laser desorption for the analysis of non- or semi-conducting materials (355 nm wavelength, <10 ps pulsing, up to 250 kHz repetition rate)
- Reflectron time of flight mass spectrometry setup offers highest mass resolving power
- Sample preparation by focused ion beam lift out with state of the art FIB-Microscope (XB-540, Carl-Zeiss)